Monomers for photoresist, polymers thereof, and photoresist compositions using the same
US6291131A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 26, 1999 |
| Grant date | Sep 18, 2001 |
| Priority date | — |
| Expiry date | Aug 26, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/127
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to novel monomers for preparing photoresist polymers, polymers thereof, and photoresist compositions using the same. The monomers of the iinvention are represented by the following Chemical Formula 1: ##STR1## PA1 wherein, X and Y individually represent oxygen, sulfur, CH.sub.2 or CH.sub.2 CH.sub.2 ; n is an integer of 1 to 5; and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 individually represent hydrogen, C.sub.1 -C.sub.10 alkyl having substituent(s) on its main or branched chain, C.sub.1 -C.sub.10 ester having substituent(s) on its main or branched chain, C.sub.1 -C.sub.10 ketone having substituent(s) on its main or branched chain, C.sub.1 -C.sub.10 carboxylic acid having substituent(s) on its main or branched chain, C.sub.1 -C.sub.10 acetal having substituent(s) on its main or branched chain, C.sub.1 -C.sub.10 alkyl having substituent(s) including one or more hydroxyl group(s) on its main or branched chain, C.sub.1 -C.sub.10 ester having substituent(s) including one or more hydroxyl group(s ) on its main or branched chain, C.sub.1 -C.sub.10 ketone having substituent(s) including one or more hydroxyl group(s) on its main or branched chain, C.sub.1 -C.sub.1…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.