Illumination system and REMA objective with lens displacement and operating process therefor

US6295122A · kind A · utility

Assignee

• CARL ZEISS · DE

Inventors

• Jorg Schultz · Aalen, DE
• Johannes Wangler · Oberkochen, DE

Key dates

• Filing date: Mar 5, 1999
• Grant date: Sep 25, 2001
• Expiry date: Mar 5, 2019

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70183
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An illumination system for a microlithography projection illumination equipment, in which a secondary light source is imaged on a reticle . The distortion of the image can be set by at least one variable optical path between optical elements, and the uniformity of the illumination is changed because of the changed distortion, in particular, in that the uniformity is increased toward the edge.