Jorg Schultz
23Patents
10h-index
19Co-inventors
64Inventor score
Filing activity: Mar 5, 1999 → Sep 21, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6198793A | Illumination system particularly for EUV lithography | Physics | 110 | Expired |
| US6438199B1 | Illumination system particularly for microlithography | Physics | 80 | Expired |
| US6859515B2 | Illumination system, particularly for EUV lithography | Physics | 54 | Expired |
| US6507440B1 | Components with an anamorphotic effect for reducing an aspect ratio of a raster element in an illumination system | Physics | 35 | Expired |
| US6400794B1 | Illumination system, particularly for EUV lithography | Physics | 33 | Expired |
| US6570168B1 | Illumination system with a plurality of light sources | Physics | 27 | Expired |
| US6859328B2 | Illumination system particularly for microlithography | Physics | 20 | Expired |
| US6366410B1 | Reticular objective for microlithography-projection exposure installations | Physics | 16 | Expired |
| US6295122A | Illumination system and REMA objective with lens displacement and operating process therefor | Physics | 15 | Expired |
| US7329886B2 | EUV illumination system having a plurality of light sources for illuminating an optical element | Physics | 11 | Expired |
| US7583433B2 | Multi mirror system for an illumination system | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6840640B2 | Multi mirror system for an illumination system | Emerging Cross-Sectional Technologies | 9 | Expired |
| US7071476B2 | Illumination system with a plurality of light sources | Physics | 8 | Expired |
| US6704095B2 | Control of a distribution of illumination in an exit pupil of an EUV illumination system | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6770894B1 | Illumination system with field mirrors for producing uniform scanning energy | Physics | 6 | Expired |
| US6445442B2 | Projection-microlithographic device | Physics | 6 | Expired |
| US7006595B2 | Illumination system particularly for microlithography | Physics | 6 | Expired |
| US7126137B2 | Illumination system with field mirrors for producing uniform scanning energy | Physics | 6 | Expired |
| US6680803B2 | Partial objective in an illuminating systems | Physics | 5 | Expired |
| US7130129B2 | Reticle-masking objective with aspherical lenses | Physics | 3 | Expired |
| US7443948B2 | Illumination system particularly for microlithography | Physics | 1 | Active |
| US7148495B2 | Illumination system, particularly for EUV lithography | Physics | 1 | Expired |
| US7372634B2 | Reticle-masking objective with aspherical lenses | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.