Method of fabricating well
US6297133A · kind A · utility
2Cited by
9References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 1998 |
| Grant date | Oct 2, 2001 |
| Priority date | — |
| Expiry date | Jul 28, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B12/09
Abstract
A method of manufacturing wells comprises the step of providing a p-type substrate and then sequentially forming a p-well and n-well with low dosage in the p-type substrate. Thereafter, energy is used to dope n-type ions into the p-well. The triple well formed in the present invention has low dosage ions, hence the DRAM formed on the triple well in subsequent process can have a faster refresh time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.