One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system
US6302964A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2000 |
| Grant date | Oct 16, 2001 |
| Priority date | — |
| Expiry date | Mar 16, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45565
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A one-piece gas distribution faceplate for a showerhead. The one-piece gas distribution faceplate includes a first surface, a second surface, and a third surface. The one-piece gas distribution faceplate comprises a plurality of first gas holes extending through the one-piece gas distribution faceplate between the first surface and the second surface. The one-piece gas distribution faceplate has an internal gas distribution cavity defined by a plurality of interconnecting channels. A plurality of second gas holes extend through the one-piece gas distribution faceplate between the first surface into a plurality of the interconnecting channels. The interconnecting channels are fluidly coupled to a plenum that is in turn connected to at least one gas conduit. The gas conduit extends to the third surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.