Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor

US6303270A · kind A · utility

Assignees

• The Curators of the University of Missouri · US
• Brewer Science, Inc. · US

Inventors

• Tony D. Flaim · Webster Groves, US
• Douglas J. Guerrero · Rolla, US
• Michelle Fowler · Salem, US
• William J. James · Rolla, US
• Vladimir Petrovsky · Rolla, US
• Harlan U. Anderson · Rolla, US

Key dates

• Filing date: Mar 1, 1999
• Grant date: Oct 16, 2001
• Expiry date: Mar 1, 2019

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0388
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A composition is derived from an addition polymerizable organotitanium polymer which upon exposure to an oxygen plasma or baking in air, is converted to titanium dioxide (titania) or is converted to a mixed, titanium-containing metal oxide. The metal oxide formed in situ imparts etch-resistant action to a patterned photoresist layer. The composition may also be directly deposited and patterned into permanent metal oxide device features by a photolithographic process.