Transfer system for vacuum process equipment
US6305895A · kind A · utility
9Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1999 |
| Grant date | Oct 23, 2001 |
| Priority date | — |
| Expiry date | Dec 21, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A transfer system 7 for carrying a wafer W into/out of a process chamber 4 is provided in a box 10 defining a load-lock chamber 3. The box 10 is divided into a first chamber 11 and a second chamber 12. A transfer arm 21 for carrying the wafer W is provided in the first chamber 11. A linearly moving system 14 for linearly moving the transfer arm 21 is provided in the second chamber 12. The internal pressure in the first chamber is set to be higher than the internal pressure in the second chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.