CVD reactor

US6309465A · kind A · utility

Assignee

• Aixtron, Inc. · DE

Inventors

• Holger Jurgensen · Aachen, DE
• Marc Deschler · Hauset, BE
• Gerd Strauch · Aachen, DE
• Markus Schumacher · Kreuzau, DE
• Johannes Käppeler · Harsewinkel, DE

Key dates

• Filing date: Nov 18, 1999
• Grant date: Oct 30, 2001
• Expiry date: Nov 18, 2019

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/455
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A CVD reactor comprising: a reactor casing with a casing cover, a heated susceptor for one wafer or several wafers, which is disposed in the reactor casing, a fluid inlet unit including a plurality of openings facing said wafer or wafers through which the CVD media, which is moderately heated, enter the reactor, and a fluid outlet disposed on the periphery of the reactor casing, through which the introduced media is discharged; wherein the fluid outlet has roughly the shape of a disk with a plurality of outlet openings for the discharge of CVD media, and is disposed between the susceptor and the reactor cover in such a way that the fluid outlet is heated by the susceptor by radiation and hence adjusts itself to a temperature between the temperature of the susceptor and the reactor cover through which the CVD media enter in a moderately heated state.