Composition for reflection reducing coating
US6309789A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | May 25, 2000 |
| Grant date | Oct 30, 2001 |
| Priority date | — |
| Expiry date | May 25, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The anti-reflective coating composition comprising at least perfluoroalkylsulfonic acid (A) represented by the general formula: C.sub.n F.sub.2n+1 SO.sub.3 H (n is an integer of 4 to 8), organic amine (B), water-soluble polymer (C), perfluoroalkyl sulfonamide (D) represented by the general formula: C.sub.n F.sub.2n+1 SO.sub.2 NH.sub.2 (n is an integer of 1 to 8) and water (E) and having a pH value of 1.3 to 3.3 is applied onto a photoresist film formed on a substrate, thus forming an anti-reflective coating. The photoresist and anti-reflective coating are then exposed to light and developed to give a resist pattern. The coating composition can form a uniform anti-reflective coating free of standing wave, multiple reflection, T-top and PED (Post Exposure Delay) in a small amount of drip onto any types of resists regardless of the surface shape of a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.