Yusuke Takano
56Patents
7h-index
72Co-inventors
75Inventor score
Filing activity: Feb 10, 1995 → Jan 23, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7235348B2 | Water soluble negative tone photoresist | Physics | 36 | Expired |
| US5757193A | Apparatus for detecting defects of wiring board | Physics | 26 | Expired |
| US6309789A | Composition for reflection reducing coating | Physics | 25 | Expired |
| US5844249A | Apparatus for detecting defects of wires on a wiring board wherein optical sensor includes a film of polymer non-linear optical material | Physics | 21 | Expired |
| US7399582B2 | Material for forming fine pattern and method for forming fine pattern using the same | Physics | 10 | Expired |
| US10405239B2 | Core node, base station, radio terminal, communication method, radio resource allocation method, base station selection method, and readable medium | Electricity | 8 | Active |
| US7745093B2 | Water soluble resin composition and method for pattern formation using the same | Emerging Cross-Sectional Technologies | 8 | Active |
| US8084186B2 | Hardmask process for forming a reverse tone image using polysilazane | Emerging Cross-Sectional Technologies | 7 | Active |
| US10284495B2 | Slice management system and slice management method for dynamically adjusting resources allocated to a slice based on a resource utilization status | Electricity | 6 | Active |
| US6692892B1 | Composition for antireflection coating | Emerging Cross-Sectional Technologies | 6 | Expired |
| US5652327A | Triazine polymers | Chemistry; Metallurgy | 5 | Expired |
| US7335464B2 | Water soluble resin composition, method of pattern formation and method of inspecting resist pattern | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7195863B2 | Development defect preventing process and material | Electricity | 5 | Expired |
| US8705354B2 | Communication system and communication control method | Electricity | 4 | Active |
| US10140112B2 | Update management system and update management method | Physics | 4 | Active |
| US9165818B2 | Method for forming insulating film | Electricity | 3 | Active |
| US7592132B2 | Method for fine pattern formation | Chemistry; Metallurgy | 3 | Expired |
| US9029071B2 | Silicon oxynitride film formation method and substrate equipped with silicon oxynitride film formed thereby | Electricity | 2 | Active |
| US7018785B2 | Method for forming pattern and treating agent for use therein | Physics | 2 | Expired |
| US11318596B2 | Power tool having hammer mechanism | Performing Operations; Transporting | 2 | Active |
| US7365115B2 | Composition for antireflection coating and method for forming pattern | Emerging Cross-Sectional Technologies | 2 | Expired |
| US10791482B2 | Core node, base station, radio terminal, communication method, radio resource allocation method, base station selection method, and readable medium | Electricity | 2 | Active |
| US7799513B2 | Process for preventing development defect and composition for use in the same | Physics | 1 | Expired |
| US8501394B2 | Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern | Emerging Cross-Sectional Technologies | 1 | Active |
| US9143981B2 | Communication system and communication control method | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.