Process for fabricating an optical device
US6312581A · kind A · utility
17Cited by
5References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 1999 |
| Grant date | Nov 6, 2001 |
| Priority date | — |
| Expiry date | Nov 30, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12061
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for fabricating a silica-based optical device on a silicon substrate is disclosed. The device has a cladding formed in a silicon substrate. The device also has an active region, and that active region is formed on the cladding. The cladding is fabricated by forming a region of porous silicon in the silicon substrate. The porous silicon is then oxidized and densified. After densification, the active region of the device is formed on the cladding.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.