Lithography chuck having piezoelectric elements, and method
US6313567A · kind A · utility
39Cited by
12References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2000 |
| Grant date | Nov 6, 2001 |
| Priority date | — |
| Expiry date | Apr 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70783
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography chuck (100) holds a flat object (150), such as a semiconductor wafer (150) at the backside (152). The chuck has, supported on a base plate (105), a plurality of pins (110-n) to receive partial forces (F.sub.n) from the backside (152) and a plurality of piezoelectric elements (120-n) attached to the pins to sense the partial forces (F.sub.n) applied from the object (150) to the pins (110-n). The piezoelectric elements (120-n) apply partial displacements (B.sub.n) of the pins (110-n) to act on selected areas of the object (150) and thereby compensate for irregularities in the backside contour.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.