Planarizing antireflective coating compositions
US6316165A · kind A · utility
62Cited by
23References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 8, 1999 |
| Grant date | Nov 13, 2001 |
| Priority date | — |
| Expiry date | Mar 8, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/151
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions ("ARCs"), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.