Patent · US Expired

Single crystal silicon sensor with high aspect ratio and curvilinear structures

US6316796A · kind A · utility

15Cited by
34References
54Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 23, 1996
Grant dateNov 13, 2001
Priority date
Expiry dateMay 23, 2016

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S73/01
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

In one aspect, the invention provides a semiconductor sensor which includes a first single crystal silicon wafer layer. A single crystal silicon structure is formed in the first wafer layer. The structure includes two oppositely disposed substantially vertical major surfaces and two oppositely disposed generally horizontal minor surfaces. The aspect ratio of major surface to minor surface is at least 5:1. A carrier which includes a recessed region is secured to the first wafer layer such that said structure is suspended opposite the recessed region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.