Exposure apparatus and device manufacturing method using the same
US6322220A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 16, 1997 |
| Grant date | Nov 27, 2001 |
| Priority date | — |
| Expiry date | Dec 16, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/134
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes a first dispersing element for dispersing substantially parallel laser light, from a laser, with respect to the wavelength to provide light beams of wavelength units, a first optical system for collecting each light beam of a wavelength unit from the first dispersing element, a wavelength selecting device for passing a predetermined wavelength region of light, of the light beams of wavelength units each being collected by the first optical system, a second optical system for receiving the light from the wavelength selecting device and providing parallel light beams of wavelength units, and a second dispersing element for combining the parallel light beams of wavelength units from the second optical system, the second dispersing element having substantially the same angular dispersion as that of the first dispersing element and a direction of dispersion opposite to that of the first dispersing element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.