Wafer container cleaning system
US6322633A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 28, 1999 |
| Grant date | Nov 27, 2001 |
| Priority date | — |
| Expiry date | Jul 28, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6704
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning system for cleaning carriers or containers used to carry semiconductor wafers has a door cleaner adjacent to a centrifugal box cleaner. Box holder assemblies are attached to a rotor within the box cleaner. Upper and lower hooks on the box holder assemblies hold boxes as the rotor spins. The door cleaner has a base which holds doors in a vertical and upright position. An elevator lowers the base into an ultrasonic cleaning tank. The tank lid seals the tank during use. Ultrasonic cleaning fluid is filtered and cycled into and out of the tank. Boxes and their doors, such as front opening unified pods (FOUP) are both efficiently cleaned and handled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.