Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
US6324256A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2000 |
| Grant date | Nov 27, 2001 |
| Priority date | — |
| Expiry date | Aug 23, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/003
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A laser-plasma EUV radiation source (50) that generates larger liquid droplets (72) for the plasma target material. The EUV source (50) forces a liquid (58), preferably Xenon, through a nozzle (64), instead of forcing a gas through the nozzle. The geometry of the nozzle (64) and the pressure of the liquid (58) through the nozzle (64) atomizes the liquid (58) to form a dense spray (70) of droplets (72). Because the droplets (72) are formed from a liquid, they are larger in size, and are more conducive to generating EUV radiation. A condenser (60) is used to convert gaseous Xenon (54) to the liquid (58) prior to being forced through the nozzle (64).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.