Method for forming oxide layer on conductor plug of trench structure
US6326320A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 5, 2000 |
| Grant date | Dec 4, 2001 |
| Priority date | — |
| Expiry date | Sep 5, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02274
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming oxide layer on conductor plug of trench structure is proposed. The invention includes following essential steps: First, provide a substrate where a trench locates inside the substrate, herein the trench is partly filled by a conductor plug. Second, forms a plasma enhanced tetraethyl-orthosilicate layer on the substrate, herein the plasma enhanced tetraethyl-orthosilicate layer also fills the trench and covers the conductor plug. Finally, removes the plasma enhanced tetraethyl-orthosilicate layer until the substrate is not covered by the plasma enhanced tetraethyl-orthosilicate layer, herein the conductor plug still is covered by the plasma enhanced tetraethyl-orthosilicate layer. Additional, advantages of application of plasma enhanced tetraethyl-orthosilicate layer comprise compacted structure and high deposit rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.