Optimization of reticle rotation for critical dimension and overlay improvement
US6327023A · kind A · utility
12Cited by
8References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1999 |
| Grant date | Dec 4, 2001 |
| Priority date | — |
| Expiry date | Dec 23, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scanning method capable of reducing across chip linewidth variation and image placement error is disclosed, the method including a step whereby a reticle having a plurality of lines is scanned in a direction perpendicular to the lines. The scanning method includes a radiation source provided with an aperture with a slot. In this case, it is preferable that the radiation source keeps the rectangular slot in the direction that minimizes pattern distortions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.