Scott Bukofsky
18Patents
8h-index
34Co-inventors
64Inventor score
Filing activity: May 26, 1999 → Mar 10, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6993741B2 | Generating mask patterns for alternating phase-shift mask lithography | Physics | 210 | Expired |
| US6563566B2 | System and method for printing semiconductor patterns using an optimized illumination and reticle | Physics | 108 | Expired |
| US6777147B1 | Method for evaluating the effects of multiple exposure processes in lithography | Physics | 67 | Expired |
| US6376149B2 | Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores | Physics | 27 | Expired |
| US6451490B1 | Method to overcome image shortening by use of sub-resolution reticle features | Physics | 18 | Expired |
| US6327023A | Optimization of reticle rotation for critical dimension and overlay improvement | Physics | 12 | Expired |
| US6451508B1 | Plural interleaved exposure process for increased feature aspect ratio in dense arrays | Physics | 12 | Expired |
| US6511791B1 | Multiple exposure process for formation of dense rectangular arrays | Physics | 11 | Expired |
| US7171034B2 | Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography | Physics | 8 | Expired |
| US7413833B2 | Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask | Electricity | 8 | Expired |
| US7239371B2 | Density-aware dynamic leveling in scanning exposure systems | Physics | 7 | Expired |
| US7229936B2 | Method to reduce photoresist pattern collapse by controlled surface microroughening | Electricity | 4 | Expired |
| US6566030B2 | Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores | Physics | 3 | Expired |
| US6824932B2 | Self-aligned alternating phase shift mask patterning process | Physics | 3 | Expired |
| US7475380B2 | Generating mask patterns for alternating phase-shift mask lithography | Physics | 2 | Active |
| US6891169B2 | Electron beam array write head system and method | Electricity | 1 | Expired |
| US7354779B2 | Topography compensated film application methods | Electricity | 1 | Expired |
| US7135255B2 | Layout impact reduction with angled phase shapes | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.