Method for controlling a gas injector in a semiconductor processing reactor
US6328221A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2000 |
| Grant date | Dec 11, 2001 |
| Priority date | — |
| Expiry date | Feb 9, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A single computer controls both a reactor and a gas jet assembly in a system. The gas jet assembly is mounted to the reactor such that a gas injector extends into the reactor. The gas injector includes a bent tip which extent at an angle away from the longitudinal axis of the gas injector. The gas jet assembly controls both the angular and longitudinal positions of the gas injector. By controlling the longitudinal position of the gas injector, the gas jet assembly controls the location at which process gas is introduced into the reactor. Further, by controlling the angular position of the gas injector, the gas jet assembly controls the direction in which process gas is introduced into the reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.