Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
US6333010A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1999 |
| Grant date | Dec 25, 2001 |
| Priority date | — |
| Expiry date | Sep 20, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.