Charged beam mask having strut wider than charged beam, with shape that matches charged beam
US6335127B1 · kind B1 · utility
4Cited by
1References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 25, 1999 |
| Grant date | Jan 1, 2002 |
| Priority date | — |
| Expiry date | Jun 25, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention provides a charged beam projection mask, a charged beam exposure apparatus, and the like which prevent variations in exposure dose and a positional error of a pattern projected on a wafer, thereby improving a pattern precision. In the charged beam mask, strut portions separating mask pattern regions constituting a stripe in one direction have a width larger than the width of a beam on the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.