Haruhito Ono
32Patents
11h-index
37Co-inventors
75Inventor score
Filing activity: Jul 27, 1988 → Apr 4, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5682085A | Multi-electron beam source and image display device using the same | Electricity | 48 | Expired |
| US4956578A | Surface conduction electron-emitting device | Electricity | 47 | Expired |
| US5185554A | Electron-beam generator and image display apparatus making use of it | Electricity | 44 | Expired |
| US6965153B1 | Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method | Electricity | 43 | Expired |
| US6872950B2 | Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method | Electricity | 38 | Expired |
| US7109494B2 | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector | Electricity | 31 | Expired |
| US7060984B2 | Multi-charged beam lens and charged beam exposure apparatus using the same | Electricity | 30 | Expired |
| US6903345B2 | Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method | Electricity | 29 | Expired |
| US7126141B2 | Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method | Electricity | 24 | Expired |
| US6603128B2 | Charged-particle beam exposure apparatus and device manufacturing method | Electricity | 18 | Expired |
| US6011567A | Image forming apparatus | Electricity | 12 | Expired |
| US6157137A | Multi-electron beam source with driving circuit for preventing voltage spikes | Electricity | 11 | Expired |
| US5627436A | Multi-electron beam source with a cut off circuit and image device using the same | Electricity | 11 | Expired |
| US4999083A | Method of etching crystalline material with etchant injection inlet | Electricity | 10 | Expired |
| US6872951B2 | Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing method | Electricity | 9 | Expired |
| US5138402A | Semiconductor electron emitting device | Electricity | 9 | Expired |
| US6559463B2 | Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing method | Electricity | 8 | Expired |
| US6946662B2 | Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method | Electricity | 7 | Expired |
| US6005333A | Electron beam-generating device, and image-forming apparatus and recording apparatus employing the same | Physics | 7 | Expired |
| US6872952B2 | Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method | Physics | 5 | Expired |
| US7700390B2 | Method for fabricating three-dimensional photonic crystal | Physics | 5 | Active |
| US6335127B1 | Charged beam mask having strut wider than charged beam, with shape that matches charged beam | Emerging Cross-Sectional Technologies | 4 | Expired |
| US8361336B2 | Imprint method for imprinting a pattern of a mold onto a resin material of a substrate and related substrate processing method | Performing Operations; Transporting | 4 | Active |
| US5757123A | Electron-beam generator and image display apparatus making use of it | Electricity | 4 | Expired |
| US8191994B2 | Liquid ejection head utilizing deflection members | Performing Operations; Transporting | 4 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.