Integrated ion implant scrubber system
US6338312B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 1998 |
| Grant date | Jan 15, 2002 |
| Priority date | — |
| Expiry date | Apr 15, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S95/90
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An ion implantation process system, including an ion implanter apparatus for carrying out an ion implantation process. A supply of source gas for the ion implantation process is arranged to flow to the ion implanter apparatus, which discharges an effluent gas stream including ionization products of the source gas during the ion implantation process. The system includes an effluent abatement apparatus for removing hazardous effluent species from the effluent gas stream. The source gas may be furnished from a low pressure gas source in which the source gas is sorptively retained in a vessel on a sorbent medium having affinity for the source gas, and desorbed for dispensing to the process system. A novel scrubbing composition may be employed for effluent treatment, and the scrubbing composition breakthrough of scrubbable component may be monitored with a device such as a quartz microbalance monitor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.