Magnetron sputtering cathode with magnet disposed between two yoke plates
US6338781B1 · kind B1 · utility
16Cited by
14References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 30, 1999 |
| Grant date | Jan 15, 2002 |
| Priority date | — |
| Expiry date | Aug 30, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3458
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a device for cathode sputtering for producing coatings on a substrate by means of a sputtering cathode, which can be arranged in a vacuum chamber and comprises pole shoes, a target and at least one magnet or ring magnet 9 arranged concentrically with respect to the center axis of the sputtering cathode, wherein a divided yoke is arranged axially symmetrically with respect to the center axis of the sputtering cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.