Film forming method
US6338872B1 · kind B1 · utility
13Cited by
4References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 1999 |
| Grant date | Jan 15, 2002 |
| Priority date | — |
| Expiry date | Jun 22, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film forming method is described using an apparatus with a plurality of vacuum chambers which communicate with each other via a connection, where the apparatus has one or more detachable treatment rooms and where the method includes continuously forming a plurality of films on a band-shaped substrate within the treatment rooms, while continuously moving the substrate through the treatment rooms. The treatment rooms within said desired vacuum chambers are replaced after forming the film for a predetermined period as a part of the film forming method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.