Mask with linewidth compensation and method of making same

US6338921B1 · kind B1 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• James A. Bruce · Williston, US
• David V. Horak · South Burlington, US
• Randy W. Mann · Jericho, US
• Jed H. Rankin · South Burlington, US
• Andrew J. Watts · Saint Johnsbury Center, US

Key dates

• Filing date: Jan 7, 2000
• Grant date: Jan 15, 2002
• Expiry date: Jan 7, 2020

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/36
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A mask (50′) with linewidth compensation and a method of making same. The mask provides for optimized imaging of isolated patterns (64) and nested patterns (70) present on the same mask. The compensated mask is formed from an uncompensated mask (50) and comprises an upper surface (56) upon which the isolated and nested patterns are formed. The isolated pattern comprises a first segment (76) having first sidewalls (76S). The nested pattern comprises second segments (72) proximate each other and having second sidewalls (72S). A partial conformal layer (86) covers the first segment and has feet (90) outwardly extending a distance d from the first sidewalls along the upper surface. The feet are preferably of a thickness that partially transmits exposure light.