Liquid photoimagable resist which is resistant to blocking
US6342332B1 · kind B1 · utility
3Cited by
28References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 5, 1996 |
| Grant date | Jan 29, 2002 |
| Priority date | — |
| Expiry date | Aug 6, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/1105
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A liquid applied photoresist composition is disclosed which exhibits a favorable balance of photospeed and overall physical properties. The photoresist composition includes a binder, a multifunctional monomer, a photoinitiator, and a solvent. The photoinitiator is present in the photoresist in an amount of greater than about 10% by weight of the photoresist without solvent. The photoresist when applied is relatively resistant to blocking when applied to a substrate.A process for producing a negative resist image on a surface using the photoresist is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.