Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
US6342562B1 · kind B1 · utility
19Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 20, 2000 |
| Grant date | Jan 29, 2002 |
| Priority date | — |
| Expiry date | Apr 20, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32139
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.