Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and method
US6342941B1 · kind B1 · utility
23Cited by
10References
41Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2000 |
| Grant date | Jan 29, 2002 |
| Priority date | — |
| Expiry date | Feb 15, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for exposing an image of a pattern formed in a mask onto a sensitive substrate. The mask is irradiated with an irradiation light. Data is computed relating to the thermal expansion saturation point of the mask due to absorption of the irradiation light. The mask is expanded to the thermal expansion saturation point based on the computed data, and the image of the mask pattern is exposed onto the sensitive substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.