Patent · US Expired

Magnetron sputtering cathode with magnet disposed between two yoke plates

US6344114B1 · kind B1 · utility

19Cited by

16References

40Claims

0Family size

Assignee

SINGULUS TECHNOLOGIES AG · DE

Inventors

Eggo Sichmann · Gelnhausen, DE
Michael L. Muecke · Karben, DE
Wolfgang Becker · Eppstein, DE
Klaus Truckenmueller · Kleinheubach, DE

Key dates

Filing date	Aug 30, 1999
Grant date	Feb 5, 2002
Priority date	—
Expiry date	Aug 30, 2019

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3458
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method of coating a substrate by magnetron cathode sputtering includes a sputtering cathode having pole shoes and being arranged in a vacuum chamber. A target and a magnetic field are provided in an area of the surface of the target and the magnetic field is varied stepwise and/or continuously to displace the plasma radially such that the erosion groove is likewise displaced radially. The variable magnetic field is generated by coils between the back surface of the target and a yoke plate while a static magnetic field is gernated by an annularly arranged magnet in the area of the yoke plate and a target space between the target and the substrate is shielded by means of an iron core which also increases the field strength of the variable magnetic field.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.