Radiation sensitive material and method for forming pattern
US6344304B1 · kind B1 · utility
18Cited by
24References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 1999 |
| Grant date | Feb 5, 2002 |
| Priority date | — |
| Expiry date | Nov 12, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensitive composition comprising a copolymer having a structural unit of (me)acrylonitrile and a structural unit generating an alkali soluble group and a substance generating an acid by application of radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.