Substrate treatment device
US6352084B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 23, 1999 |
| Grant date | Mar 5, 2002 |
| Priority date | — |
| Expiry date | Apr 23, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A device for the treatment of substrates (2) has a container having a bottom and being filled with a treatment fluid. The treatment fluid streams in from below through the bottom of the container. At least two inlet tubes are provided for the treatment fluid underneath the container bottom. Each of the at least two inlet tubes is provided with projecting comb-like distribution channels. The at least two inlet tubes and the distribution channels are arranged in a common plane. The distribution channels of one of the at least two inlet tubes are respectively positioned between two of the distribution channels of the other one of the two inlet tubes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.