Patent · US Expired

Method for stripping organic based film

US6352937B1 · kind B1 · utility

6Cited by
5References
18Claims
0Family size

Assignees

Inventors

Key dates

Filing dateApr 27, 1998
Grant dateMar 5, 2002
Priority date
Expiry dateApr 27, 2018

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/0212
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

There is provided a method used for processing an organic low dielectric constant insulating film to a desired shape for enabling facilitated stripping of an organic film formed on top of the organic low dielectric constant insulating film. Specifically, there is provided a method for stripping an organic film formed on a layered unit having at least an organic low dielectric constant insulating film. This method includes generating radicals in a gas mainly composed of fluorine-based gas, and stripping the organic film by the generated radicals.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.