Method and apparatus for manufacturing a micromechanical device
US6355181B1 · kind B1 · utility
35Cited by
7References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 17, 1999 |
| Grant date | Mar 12, 2002 |
| Priority date | — |
| Expiry date | Nov 17, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0132
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In the manufacture of a micromechanical device, a substrate, having a mask thereon, is etched using a flourine-containing etchant gas or vapour in the absence of a plasma through an opening in the mask to a desired depth to form a trench having a side wall and a base in the substrate. A layer of protecting substance is deposited on the exposed surfaces of the substrate and mask, and the protecting substance is then selectively removed from the base. The base is then etched using the fluorine-containing etchant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.