Semiconductor production system with an in-line subsystem
US6356338B2 · kind B2 · utility
13Cited by
5References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 6, 1999 |
| Grant date | Mar 12, 2002 |
| Priority date | — |
| Expiry date | Jan 6, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70991
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor production system has an exposure apparatus, a coater-developer, and an in-line subsystem for connecting the exposure apparatus and the coater-developer. The in-line subsystem has a removing unit for removing gaseous chemical substances that enter from an in-line connecting section. The system has a shutter or an air curtain to suppress entry of gaseous chemical substances from the in-line connecting section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.