Substrate cleaning apparatus and method
US6357457B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 1999 |
| Grant date | Mar 19, 2002 |
| Priority date | — |
| Expiry date | Mar 15, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for cleaning a substrate comprises a spin chuck for holding a substrate substantially horizontally a rotation driving mechanism for rotating the spin chuck, a lower nozzle having a plurality of liquid outlet ports facing both a peripheral portion and a center portion of a lower surface oaf the substrate held by the spin chuck, a process liquid supply mechanism for supplying a first process liquid to the lower nozzle, and a controller for controlling operations of the process liquid supply mechanism and the rotation driving mechanism, individually, in which the controller controls the rotation driving mechanism to rotate the spin chuck and controls the process liquid supply mechanism to supply a first process liquid to the lower nozzle, thereby outputting the first process liquid toward the peripheral portion and the center portion of the lower surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.