Positioning device, exposure device, and device manufacturing method
US6359679B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2000 |
| Grant date | Mar 19, 2002 |
| Priority date | — |
| Expiry date | Jan 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/62
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positioning device includes a stage which is movable along a reference surface, a stage driving mechanism for driving the stage, and an inertia imparting mechanism for reducing a reaction force produced by driving the stage. The inertia imparting mechanism has a mass body, which is movable with respect to a stage base or a structure, and a mass body driving mechanism for driving the mass body, and the stage base or structure is given inertia by driving the mass body. The inertia imparting mechanism also includes a reaction force compensation, which, by moving the mass body, reduces reaction force caused by motion of the stage, and a positioning compensation control system, which compensates for the position of the mass body. Thus, it is possible to reduce a reaction force produced by motion of the stage, and to compensate for position offset of the mass body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.