Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations
US6360134B1 · kind B1 · utility
3Cited by
11References
48Claims
0Family size
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Key dates
| Filing date | Jul 20, 1998 |
| Grant date | Mar 19, 2002 |
| Priority date | — |
| Expiry date | Jul 20, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An method for creating an image on a photosensitive material with enhanced inside corner resolution using a raster scan exposure system. The photosensitive material may comprise a layer of an unexposed photomask. An energy beam scan is extended by one or more addressable locations beyond the boundaries of the desire pattern at inside corner locations in both X and Y axes. Thus, the image formed in the photosensitive material and, in turn, the attenuator material more accurately reflects the desired image as defined in a data file.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.