PHOTRONICS, INC.
🏢 View company profile →51Patents
21Active
51Granted
55Portfolio score
Filing activity: Jul 3, 1997 → Apr 29, 2024 · 11 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6366319B1 | Subtractive color processing system for digital imaging | Electricity | 140 | Expired |
| US6472107B1 | Disposable hard mask for photomask plasma etching | Physics | 42 | Expired |
| US6828068B2 | Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same | Physics | 20 | Expired |
| US6524754B2 | Fused silica pellicle | Physics | 19 | Expired |
| US6996450B2 | Automated manufacturing system and method for processing photomasks | Physics | 18 | Expired |
| US6842881B2 | Rule based system and method for automatically generating photomask orders in a specified order format | Physics | 13 | Expired |
| US6760640B2 | Automated manufacturing system and method for processing photomasks | Physics | 13 | Expired |
| US7640529B2 | User-friendly rule-based system and method for automatically generating photomask orders | Physics | 11 | Expired |
| US6406818B1 | Method of manufacturing photomasks by plasma etching with resist stripped | Physics | 11 | Expired |
| US6749974B2 | Disposable hard mask for photomask plasma etching | Physics | 9 | Expired |
| US7074530B2 | Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same | Physics | 9 | Expired |
| US6472766B2 | Step mask | Physics | 9 | Expired |
| US6682861B2 | Disposable hard mask for phase shift photomask plasma etching | Physics | 7 | Expired |
| US6806006B2 | Integrated cooling substrate for extreme ultraviolet reticle | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6855463B2 | Photomask having an intermediate inspection film layer | Physics | 6 | Expired |
| US7851110B2 | Secure photomask with blocking aperture | Physics | 5 | Active |
| US9304334B2 | Microfluidic thermoptic energy processor | Emerging Cross-Sectional Technologies | 5 | Active |
| US6567588B2 | Method for fabricating chirped fiber bragg gratings | Physics | 4 | Expired |
| US7473500B2 | Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same | Physics | 4 | Active |
| US7480539B2 | Automated manufacturing system and method for processing photomasks | Physics | 4 | Active |
| US7356374B2 | Comprehensive front end method and system for automatically generating and processing photomask orders | Physics | 4 | Expired |
| US7396617B2 | Photomask reticle having multiple versions of the same mask pattern with different biases | Physics | 3 | Expired |
| US7312004B2 | Embedded attenuated phase shift mask with tunable transmission | Physics | 3 | Expired |
| US6360134B1 | Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations | Physics | 3 | Expired |
| US7049034B2 | Photomask having an internal substantially transparent etch stop layer | Physics | 3 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.