Apparatus for removing noble metal contamination from liquids
US6365042B1 · kind B1 · utility
4Cited by
10References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 2, 1997 |
| Grant date | Apr 2, 2002 |
| Priority date | — |
| Expiry date | Jun 2, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S210/914
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Silicon is employed as a reducing agent in an acid bath to adsorb noble metals present as contaminants in the acid. In the manufacture of silicon devices for electronic memory and other devices, polonium-210 is adsorbed by silicon getters to reduce soft error rate attributable to alpha particle emissions from the radioactive polonium. The noble metals in addition to polonium which can be plated onto silicon using the disclosed method are gold, silver, platinum, copper, palladium, mercury, selenium and bismuth.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.