Spin-on-glass anti-reflective coatings for photolithography
US6365765B1 · kind B1 · utility
79Cited by
22References
3Claims
0Family size
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Key dates
| Filing date | Oct 27, 2000 |
| Grant date | Apr 2, 2002 |
| Priority date | — |
| Expiry date | Oct 27, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.