Patent · US Expired

Multi-beam scanning method, apparatus and multi-beam light source device achieving improved scanning line pitch using large light emitting points interval

US6366384B1 · kind B1 · utility

28Cited by
4References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 15, 1999
Grant dateApr 2, 2002
Priority date
Expiry dateJun 15, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S359/90
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A multi-beam scanning method for scanning a scanning surface with a plurality of beams which are formed into a plurality of beam spots separated from each other in a sub scanning direction includes providing n number of semiconductor laser array units, each of the n number of semiconductor laser array units having m number of light emitting points, where n is not equal to 1 and m is not equal to 1, coupling light beams emitted from the light emitting points of the semiconductor laser arrays, synthesizing the coupled beams with a beam synthesizing device to obtain m×n number of beams and deflecting the m×n number of beams at substantially the same time such that the deflected beams are impinged on the scanning surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.