X-ray mask blank, X-ray mask and method for manufacturing the same
US6366640B1 · kind B1 · utility
3Cited by
3References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 12, 1999 |
| Grant date | Apr 2, 2002 |
| Priority date | — |
| Expiry date | Nov 12, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/10
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
There is disclosed an X-ray mask comprising, on a support substrate 11a, an X-ray transmission film 12 for transmitting X-rays and an X-ray absorber pattern 13a formed on the X-ray transmission film 12 for absorbing the X-rays. The X-ray absorber pattern 13a is formed of a material which contains tantalum, boron, nitrogen and/or oxygen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.