Patent · US Expired

Semiconductor processing article

US6368410B1 · kind B1 · utility

44Cited by

21References

14Claims

0Family size

Assignee

General Electric Company · US

Inventors

Thomas Bert Gorczyca · Schenectady, US
Udo Heinz Retzlaff · Wattenscheid, DE
Stephan Popp · Emskirchen, DE

Key dates

Filing date	Jun 28, 1999
Grant date	Apr 9, 2002
Priority date	—
Expiry date	Jun 28, 2019

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2204/08
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

A semiconductor processing article is characterized by extended useful life. The article is used in a semiconductor furnace system, particularly in a low pressure chemical vapor deposition furnace for prolonged periods without requiring cleaning to remove build-up film. The semiconductor processing article is a quartz body characterized by a surface roughness having a first component with an average deviation from a first mean surface of about 2.5 to 50 microns, and a second component with an average deviation from a second mean surface of about 0.25 to 5 microns. The processing article is prepared for use in the furnace by mechanically blasting and chemically etching the surface of the article.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.