Mask repair
US6368753B1 · kind B1 · utility
9Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1999 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Aug 27, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for repairing scalpel masks is described. In particular, opaque defects are repaired by milling with a gallium beam at a sufficient energy to ensure appropriate implantation of gallium into the membrane underlying the blocking material. Transparent defects are repaired using a gallium beam that impacts styrene gas in the vicinity of the defect to be repaired.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.