Optical device formed on a substrate with thermal isolation regions formed therein
US6370307B1 · kind B1 · utility
6Cited by
5References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 15, 1999 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Jul 15, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/103
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical device that is a waveguide with a heating element thereon that is formed on a silicon substrate is disclosed. The waveguide is formed on a region of porous silicon formed in the silicon substrate. The porous silicon region provides greater resistance to the flow of heat than the silicon substrate on which the device is formed. Optionally, the porous silicon region also provides greater resistance to the flow of heat than the waveguide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.