Lithographic projection apparatus
US6373072B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 21, 1999 |
| Grant date | Apr 16, 2002 |
| Priority date | — |
| Expiry date | Jun 21, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus has a radiation system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, first driving means, for moving the mask table in a given reference direction substantially parallel to the plane of the table, second driving means, for moving the substrate table parallel to the reference direction so as to be synchronous with the motion of the mask table. The lithographic projection apparatus also has a first measuring means, for determining the momentary position of the mask table with respect to a fixed reference point, second measuring means, for determining the momentary position of the substrate table with respect to a fixed reference point, and means for comparing the measured momentary position of the substrate table with a desired momentary position of the substrate table for generating a position error signal in accordance with a difference between the said two positions, and for passing that signal to correctio…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.