Multiple etch contact etching method incorporating post contact etch etching
US6376384B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2000 |
| Grant date | Apr 23, 2002 |
| Priority date | — |
| Expiry date | Apr 24, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/963
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming a via through a silicon oxide layer. There is first provided a substrate. There is then formed over the substrate a patterned silicon nitride layer which defines a contact region beneath the patterned silicon nitride layer. There is then formed over the patterned silicon nitride layer a silicon oxide layer. There is then etched the silicon oxide layer while employing a reactive ion etch (RIE) method employing a first etchant gas composition comprising a fluorocarbon etchant gas to form: (1) an etched silicon oxide layer which exposes the contact region without substantially etching the patterned silicon nitride layer; and (2) a fluorocarbon polymer residue layer formed upon at least one of the etched silicon oxide layer and the patterned silicon nitride layer. Finally, there is stripped from the substrate the fluorocarbon polymer residue layer while employing a downstream plasma etch method employing a second etchant gas composition comprising a fluorocarbon etchant gas and oxygen. The method may also be employed in general for etching silicon oxide layers in the presence of silicon nitride layers. Similarly, the method may also in general be employed in removi…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.